Some effects of Ti+-ion implantation at elevated temperatures and following annealing on optical spectra of silica glass

Journal of Non-Crystalline Solids

Volumn 202, Issue 1-2, 1996, Pages 194-197

  Belostotsky, V ^a  

^a KURNAKOV INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPUTER SIMULATION; CRYSTAL DEFECTS; FREE RADICALS; ION IMPLANTATION; LIGHT ABSORPTION; OPTICAL VARIABLES MEASUREMENT; RADIATION EFFECTS; SPECTROSCOPY; TITANIUM; ULTRAVIOLET RADIATION;

ABSORPTION BAND; BAND CENTRED; LOCAL TENSILE STRESS FIELDS; OPTICAL SPECTRA; PEROXY RADICALS; TITANIUM OXYGEN TETRAHEDRA;

FUSED SILICA;

EID: 0030192487     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(96)00512-1     Document Type: Letter

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