Is Ti contamination in Si wafer processing an issue?

Journal of the Electrochemical Society

Volumn 143, Issue 7, 1996, Pages 2353-2356

  Chang, Li Hsin ^a,b   Cowden, William G ^a   Christiansen, Jim ^a   Werho, Dennis ^a   Theodore, N David ^a,b  

^a MOTOROLA INC   (United States)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; DIFFUSION IN SOLIDS; ION IMPLANTATION; OXIDATION; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES; SURFACE CLEANING; TITANIUM;

CRITICAL TITANIUM LEVEL;

SILICON WAFERS;

EID: 0030192345     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837006     Document Type: Article

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