Graphite formation on Ni film by chemical vapor deposition

Thin Solid Films

Volumn 280, Issue 1-2, 1996, Pages 117-123

  Yudasaka, Masako ^a   Kikuchi, Rie ^a   Matsui, Takeo ^a   Ohki, Yoshimasa ^a   Baxendale, Mark ^a   Yoshimura, Susumu ^a   Ota, Etsuro ^b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b GUNMA UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Graphite; Nickel

Indexed keywords

BACKSCATTERING; CHEMICAL VAPOR DEPOSITION; COAGULATION; ELECTRON DIFFRACTION; GRAPHITE; METALLIC FILMS; NICKEL; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

AMORPHOUS CARBON; ENERGY DISPERSIVE SPECTROMETRY; GRAPHITE FORMATION; QUARTZ GLASS; THERMAL COAGULATION;

THIN FILMS;

EID: 0030191073     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08224-7     Document Type: Article

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