Electron- and photon-stimulated desorption of the NO/Si(111) surface

Surface Science

Volumn 359, Issue 1-3, 1996, Pages 147-154

  Sakamoto, K ^a,c   Nakatsuji, K ^a   Daimon, H ^a   Yonezawa, T ^a   Suga, S ^a   Namba, H ^b   Ohta, T ^b  

^a OSAKA UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

Angle resolved DIET; Electron stimulated desorption (ESD); Low index single crystal surfaces; Nitrogen oxides; Photon stimulated desorption (PSD); Silicon

Indexed keywords

ADSORPTION; IONS; NITROGEN OXIDES; SILICON; SINGLE CRYSTALS; SURFACES;

ELECTRON STIMULATED DESORPTION; KINETIC ENERGIES; LOW INDEX SINGLE CRYSTALS SURFACES; PHOTON ENERGY; PHOTON STIMULATED DESORPTION;

DESORPTION;

EID: 0030190988     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00346-9     Document Type: Article

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