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Advanced Materials

Volumn 8, Issue 7, 1996, Pages 573-576

Surface modification and patterning of conjugated polymers with near-field optical microscopy

(4) Wei, P K a Hsu, J H a Hsieh, B R b Fann, W S a

a NATIONAL TAIWAN UNIVERSITY (Taiwan)

b XEROX CORPORATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL DEFECTS; DIFFRACTION GRATINGS; LIGHT ABSORPTION; LIGHT SOURCES; LITHOGRAPHY; OPTICAL MICROSCOPY; OPTICAL RESOLVING POWER; PHOTOCHEMICAL REACTIONS; SEMICONDUCTING POLYMERS; SURFACE TREATMENT;

BETHE AND BOUWKAMP THEORY; DIFFRACTION LIMIT; NEAR FIELD SCANNING OPTICAL MICROSCOPY; PHOTOOXIDATION INDUCED DEFECTS; POINT LIGHT SOURCE; SHEAR FORCE SIGNALS; TOPOGRAPHIC IMAGE; TWO DIMENSIONAL INTENSITY DISTRIBUTION;

ORGANIC POLYMERS;

EID: 0030190825 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.19960080708 Document Type: Article

Times cited : (41)

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