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Volumn 164, Issue 1-4, 1996, Pages 327-333

Chemical beam epitaxy on patterned substrates of InGaAs/InP heterostructures for optoelectronics and nanostructures applications

(4) Rigo, C a Vincenzoni, R b Stano, A a De Franceschi, R a

a CSELT (Italy)

b ROMA TRE UNIVERSITY (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BEAM EPITAXY; HETEROJUNCTIONS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; OPTOELECTRONIC DEVICES; PHASE DIAGRAMS; SEMICONDUCTING INDIUM COMPOUNDS; SUBSTRATES; TEMPERATURE;

METALLORGANIC FLUXES; MILLER INDEX FACES; REVERSE MESA CHANNELS; RIDGE STRUCTURES; V GROOVES;

EPITAXIAL GROWTH;

EID: 0030190560 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/0022-0248(96)00017-6 Document Type: Article

Times cited : (6)

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