Conductance and leakage in superconducting tunnel junctions

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2427-2432

  Goodchild, M S ^a,b   Barber, Z H ^a   Blamire, M G ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Technology Partnership   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC RESISTANCE; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; NIOBIUM; OXIDATION; STATISTICAL METHODS;

ALUMINUM OXIDES; BARRIER GROWTH; BARRIER THICKNESS; BUFFER LAYER; COUNTERELECTRODES; NIOBIUM NITRIDE;

TUNNEL JUNCTIONS;

EID: 0030190371     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580031     Document Type: Article

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