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Volumn 164, Issue 1-4, 1996, Pages 117-121
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Metalorganic molecular beam epitaxy growth and etching of GaSb on flat and high-index surfaces using trisdimethylaminoantimony
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Author keywords
[No Author keywords available]
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Indexed keywords
ANTIMONY;
CARRIER CONCENTRATION;
DECOMPOSITION;
ELECTRON ENERGY LEVELS;
ELECTRON TRANSITIONS;
ETCHING;
MOLECULAR BEAM EPITAXY;
PHOTOLUMINESCENCE;
SURFACES;
FULL WIDTH AT HALF MAXIMUM;
HIGH INDEX SURFACES;
HOLE MOBILITY;
METALLORGANIC MOLECULAR BEAM EPITAXY;
TRIETHYLGALLIUM;
TRISDIMETHYLAMINOANTIMONY;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 0030190174
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/0022-0248(95)01065-3 Document Type: Article |
Times cited : (14)
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References (17)
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