Frictional drag between closely spaced two-dimensional electron gases

Surface Science

Volumn 361-362, Issue , 1996, Pages 134-137

  Rubel, H ^a,b   Linfield, E H ^b   Hill, N P R ^b   Nicholls, J T ^b   Ritchie, D A ^b   Brown, K M ^b   Pepper, M ^b   Jones, G A C ^b  

^a MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Electrical transport; Electrical transport measurements; Gallium arsenide; Ion implantation; Molecular beam epitaxy; Quantum wells; Semiconductor semiconductor heterostructures; Semiconductor semiconductor interfaces

Indexed keywords

DRAG; ELECTRIC VARIABLES MEASUREMENT; FRICTION; HETEROJUNCTIONS; INTERFACES (MATERIALS); ION IMPLANTATION; MOLECULAR BEAM EPITAXY; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR QUANTUM WELLS;

ELECTRICAL TRANSPORT; ELECTRICAL TRANSPORT MEASUREMENTS; ELECTRON GASES; FRICTIONAL DRAG;

ELECTRON TRANSPORT PROPERTIES;

EID: 0030190155     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00330-5     Document Type: Article

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