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Volumn 24, Issue 7, 1996, Pages 431-447
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Ion-implanted surface analysis reference materials: Certification of dose densities from 1016 to 1013 cm-2
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Author keywords
[No Author keywords available]
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Indexed keywords
DOSIMETRY;
ION IMPLANTATION;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SURFACES;
X RAY SPECTROMETERS;
DOSE DENSITIES;
ELECTRON MICROBEAM ANALYSIS;
PRIMARY REFERENCE MATERIALS;
WAVELENGTH DISPERSIVE X RAY FLUORESCENCE SPECTROMETRY;
SEMICONDUCTOR MATERIALS;
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EID: 0030189687
PISSN: 01422421
EISSN: None
Source Type: Journal
DOI: 10.1002/(SICI)1096-9918(199607)24:7<431::AID-SIA133>3.0.CO;2-C Document Type: Article |
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Times cited : (5)
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References (31)
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