Sputtering Rates and Nanoscale Cluster Production in a Hollow-Cathode Apparatus

Nanostructured Materials

Volumn 7, Issue 5, 1996, Pages 473-486

  Xenoulis, A C ^a   Trouposkiadis, P ^a   Potiriadis, C ^a   Papastaikoudis, C ^b   Katsanos, A A ^c   Clouvas, A ^d  

^a INSTITUTE OF NUCLEAR PHYSICS   (Greece)

^b INSTITUTE OF MATERIALS SCIENCE   (Greece)

^c TECHNICAL UNIVERSITY OF CRETE   (Greece)

^d ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; DEPOSITION; ELECTRIC CURRENTS; METALS; PLASMA APPLICATIONS; PRESSURE EFFECTS; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CATHODE GEOMETRY; FLOW VELOCITY; GAS AGGREGATION TECHNIQUE; HOLLOW CATHODE PLASMA SPUTTER DEVICE; NANOCLUSTER PRODUCTION; NANOSCALE METAL CLUSTERS; SPUTTER SOURCE DISCHARGE CURRENT; SPUTTERING RATES;

NANOSTRUCTURED MATERIALS;

EID: 0030189471     PISSN: 09659773     EISSN: None     Source Type: Journal    
DOI: 10.1016/0965-9773(96)00029-3     Document Type: Article

References (22)

1. H. Gleiter, in Deformation of Polycrystals: Mechanisms and Microstructures, eds. N. Hansen, A. Horsewell, T. Leffers, H. Lilbolt, Riso Natl. Lab., Roskilde, Denmark (1981).
2. R. Birringer, H. Gleiter, H. P. Klein and P. Marquardt, Phys. Lett. A102, 365 (1984).
3. R.W. Siegel, S. Ramasamy, H. Hahn, Z. Li, T. Lu and R. Gronsky, J. Mater. Res. 3, 1367 (1988).
4. R. Birringer and H. Gleiter, in Clusters of Atoms and Molecules II, ed. H. Haberland, Springer Verlag, Berlin (1994).
5. H. Haberland, M. Martin, M. Moseler, Y. Qiang, T. Reiners and Y. Thurner, J. Vac. Sci. Technol. A 12, 2925 (1994).
6. G.M. Chow, P.G. Klemens, and P.R. Strutt, J. Appl. Phys. 66, 3304 (1989).
7. H. Hahn and R.S. Averback, J. Appl. Phys. 67, 1113 (1990).
8. G.M. Chow, C.L. Chien and A.S. Edelstein, J. Mater. Res. 6, 8 (1991).
9. G.M. Chow and A.S. Edelstein, Nanostruct. Mater. 1, 107 (1992).
10. V. Haas and R. Birringer, Nanostruct. Mater. 1, 491 (1992).
11. F.H. Kaatz, G.M. Chow and A.S. Edelstein, J. Mater. Res. 8, 995 (1993).
12. F. Frank, W. Schulze, J. Urban and B. Winter, Surf. Sci. 156, 90 (1985).
13. H. Haberland, M. Karais, M. Mall, Z. Phys. D20, 413 (1991).
14. M. B. Nielsen, J. Borgrgreen, K. Hansen, J. Pedersen, B. Holst, M. Krogh, H.D. Rasmussen, E. Sondergard and A.C. Xenoulis, in Atomic and Nuclear Clusters, eds. G.S. Anagnostatos and W. von Oertzen, Springer-Verlag, Berlin, p. 258 (1995).
15. D.H.W. Castens, J.F. Kozlowski and D.M. Gruen, High Temp. Sci. 4, 301 (1972).
16. B. Chapman, Glow Discharge Processes, John Wiley & Sons, New York (1982).
17. W.D. Westwood, J. Vac. Sci. Technol. 11, 446 (1974).
18. D.G. Williams, J. Vac. Sci. Technol. 11, 374 (1974).
19. J.L. Vossen, J. Vac. Sci. Technol. 8, 512 (1971).
20. A Roth, Vacuum Technology, North Holland, Amsterdam (1990).
21. A.C. Zettlemoyer, Nucleation Phenomena, John Wiley & Sons, New York (1977).
22. O.F. Hagena, Z. Phys. D4, 291 (1987).