Substrate Parasitics and Dual-Resistivity Substrates

IEEE Transactions on Microwave Theory and Techniques

Volumn 44, Issue 7 PART 1, 1996, Pages 1170-1174

  Lowther, Rex ^a   Begley, Patrick A ^a   Bajor, George ^a   Rivoli, Anthony ^a   Eisenstadt, William R ^b  

^a INTERSIL CORPORATION   (United States)

^b UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CROSSTALK; ELECTRIC CONDUCTIVITY; ELECTRIC LOSSES; FINITE DIFFERENCE METHOD; INDUCED CURRENTS; OPTIMIZATION; OXIDES; SEMICONDUCTING SILICON; SUBSTRATES;

CAPACITIVE COUPLING; DUAL RESISTIVITY SUBSTRATES; RESISTIVE SUBSTRATE LOSSES; SUBSTRATE PARASITICS;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0030189078     PISSN: 00189480     EISSN: None     Source Type: Journal    
DOI: 10.1109/22.508657     Document Type: Article

References (7)

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