Side-selective and non-destructive determination of the critical current density of double-sided superconducting thin films

Physica C: Superconductivity and its Applications

Volumn 265, Issue 3-4, 1996, Pages 335-340

  Hochmuth, H ^a   Lorenz, M ^a  

^a UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; CHARACTERIZATION; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); ELECTRIC CURRENTS; FINITE ELEMENT METHOD; NONDESTRUCTIVE EXAMINATION; OPTIMIZATION; SUPERCONDUCTING FILMS; SUPERCONDUCTING TRANSITION TEMPERATURE; THIN FILMS; VOLTAGE MEASUREMENT;

CURRENT DENSITY DISTRIBUTION; DOUBLE SIDED SUPERCONDUCTING THIN FILMS; PASSIVE MICROWAVE DEVICES; SEMIAUTOMATIC ROUTINE CHARACTERIZATION; SUPERCONDUCTING TRANSITION; VOLTAGE ALTERATION;

HIGH TEMPERATURE SUPERCONDUCTORS;

EID: 0030181979     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-4534(96)00303-6     Document Type: Article

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