A novel synthetic route to ether-free metal alkyl precursors

Journal of Electronic Materials

Volumn 25, Issue 7, 1996, Pages 1060-1063

  Whitaker, T J ^a   Freer, R W ^a   Martin, T ^a   Jones, A C ^b   Rushworth, S A ^b  

^a DRA   (United Kingdom)

^b Epichem Limited   (United Kingdom)

Author keywords

AlGaAs; Chemical beam epitaxy (CBE); Metal alkyl precursors

Indexed keywords

CHEMICAL BEAM EPITAXY; EPITAXIAL GROWTH; GROWTH (MATERIALS); SEMICONDUCTING GALLIUM ARSENIDE; SYNTHESIS (CHEMICAL);

ALUMINUM GALLIUM ARSENIDES; ETHYLDIMETHYLAMINES; METAL ALKYL PRECURSORS; TRIETHYLAMINES; TRIISOPROPYLGALLIUM;

ORGANOMETALLICS;

EID: 0030181249     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02659903     Document Type: Article

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