High-throughput wafer stepper with adjustable illumination modes

Solid State Technology

Volumn 39, Issue 7, 1996, Pages 193-199

  Mulkens, J ^a   Stoeldraijer, J ^a   Rogoff, R ^a   De Klerk, J ^a   Jenkins, P ^a   Wangler, J ^b   Kalmbach, G ^b   Rupp, W ^b   Piper, E ^b  

^a ASML   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; INTEGRATED CIRCUIT MANUFACTURE; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET (DUV) WAFER STEPPERS; NUMERICAL APERTURE ILLUMINATION;

PHOTOLITHOGRAPHY;

EID: 0030177146     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (7)

1. G. Reynolds, "A concept for a high-resolution optical lithographic system for producing one-half micron line widths," Proc. SPIE, vol. 15, pp. 228-238 (1986).
2. D. Fehrs et al., "Illuminator modification of an optical aligner," Proc. KTI Interface '89, pp. 217-227 (1989).
3. H. Ohtsuka et al., "Twin shifter for the new phase shift method to high-resolution lithography," Proc. SPIE, vol. 1463, pp. 112-123 (1991).
4. B. Katz et al., "Evaluation and optimization of partial coherence when using phase shift techniques on high numerical aperture i-line steppers," Proc. KTI Interface '91, pp. 179-203 (1991).
5. K. Kamon et al., "Photolithography system using annular illumination," Jap. J. of Appl. Phys., vol. 30, no. 11B, pp. 3021-3029 (Nov. 1991).
6. T. Ogawa et al., "Subquarter micron optical lithography with practical super resolution technique," SPIE Optical/Laser Microlithography VIII, vol. 2440, pp. 772-783 (March 1995).
7. P.F. Luehrmann et al., "0.35-μm lithography using off-axis illumination," SPIE Optical/Laser Microlithography VI, vol. 1927, pp. 103-124 (1993).