-
1
-
-
0029276715
-
Si/SiGe epitaxial-base transistors-Part I: Materials, physics, and circuits, and Part II: Process integration and analog applications
-
HARAME, D.L., COMFORT, J.H., CRESSLER, J.D., CRABBÉ, E.F., SUN, J.Y.-C., MEYERSON, B.S., and TICE, T.: 'Si/SiGe epitaxial-base transistors-Part I: Materials, physics, and circuits, and Part II: Process integration and analog applications', IEEE Trans. Electron Devices, 1995, 42, (3), pp. 455-482
-
(1995)
IEEE Trans. Electron Devices
, vol.42
, Issue.3
, pp. 455-482
-
-
Harame, D.L.1
Comfort, J.H.2
Cressler, J.D.3
Crabbé, E.F.4
Sun, J.Y.-C.5
Meyerson, B.S.6
Tice, T.7
-
2
-
-
0018515889
-
Determination of the minority-carrier base lifetime of junction transistors by measurements of basewidth-modulation conductances
-
BIRRITTELLA, M.S., NEUGROSCHEL, A., and LINDHOLM, F.A.: 'Determination of the minority-carrier base lifetime of junction transistors by measurements of basewidth-modulation conductances', IEEE Electron Device Lett., 1979, 26, (9), pp. 1361-1363
-
(1979)
IEEE Electron Device Lett.
, vol.26
, Issue.9
, pp. 1361-1363
-
-
Birrittella, M.S.1
Neugroschel, A.2
Lindholm, F.A.3
-
3
-
-
0019496546
-
Determination of lifetimes and recombination currents in p-n junction solar cells, diodes, and transistors
-
NEUGROSCHEL, A.: 'Determination of lifetimes and recombination currents in p-n junction solar cells, diodes, and transistors', IEEE Trans. Electron Devices, 1981, 28, (1), pp. 108-115
-
(1981)
IEEE Trans. Electron Devices
, vol.28
, Issue.1
, pp. 108-115
-
-
Neugroschel, A.1
-
4
-
-
0022813585
-
Emitter injection efficiency in heterojunction bipolar transistors
-
NEUGROSCHEL, A.: 'Emitter injection efficiency in heterojunction bipolar transistors', Solid-State Electron., 1987, 30, (11), pp. 1171-1173
-
(1987)
Solid-State Electron.
, vol.30
, Issue.11
, pp. 1171-1173
-
-
Neugroschel, A.1
-
5
-
-
0027656861
-
High-performance SiGe epitaxial base bipolar transistors produced by a reduced-pressure CVD reactor
-
HONG, M., DE FRÉSART, E., STEELE, J., ZLOTNICKA, A., STEIN, C., TAM, G., RACANELLI, M., KNOCK, L., SEE, Y.-C., and EVANS, K.: 'High-performance SiGe epitaxial base bipolar transistors produced by a reduced-pressure CVD reactor', IEEE Electron Device Lett., 1993, 14, (9), pp. 450-452
-
(1993)
IEEE Electron Device Lett.
, vol.14
, Issue.9
, pp. 450-452
-
-
Hong, M.1
De Frésart, E.2
Steele, J.3
Zlotnicka, A.4
Stein, C.5
Tam, G.6
Racanelli, M.7
Knock, L.8
See, Y.-C.9
Evans, K.10
-
7
-
-
0022162070
-
Two integral relations pertaining to the electron transport through a bipolar transistor with a nonuniform energy gap in the base region
-
KROEMER, H.: 'Two integral relations pertaining to the electron transport through a bipolar transistor with a nonuniform energy gap in the base region', Solid-State Electron., 1985, 28, (11), pp. 1101-1103
-
(1985)
Solid-State Electron.
, vol.28
, Issue.11
, pp. 1101-1103
-
-
Kroemer, H.1
-
8
-
-
0023595886
-
Prospects for a hetero-structure bipolar transistor using a silicon-germanium alloy
-
SMITH, C., and WELBOURN, A.D.: 'Prospects for a hetero-structure bipolar transistor using a silicon-germanium alloy'. IEEE BCTM Tech. Digest, 1987, pp. 57-60
-
(1987)
IEEE BCTM Tech. Digest
, pp. 57-60
-
-
Smith, C.1
Welbourn, A.D.2
-
9
-
-
0024752976
-
Heterojunction bipolar transistors using Si-Ge alloys
-
IYER, S.S., PATTON, G.L., STORK, J.M.C., MEYERSON, B.S., and HARAME, D.L.: 'Heterojunction bipolar transistors using Si-Ge alloys', IEEE Trans. Electron Devices, 1989, 36, (1), pp. 2043-2064
-
(1989)
IEEE Trans. Electron Devices
, vol.36
, Issue.1
, pp. 2043-2064
-
-
Iyer, S.S.1
Patton, G.L.2
Stork, J.M.C.3
Meyerson, B.S.4
Harame, D.L.5
-
10
-
-
0024751582
-
x/Si heterojunction bipolar transistor
-
x/Si heterojunction bipolar transistor', IEEE Trans. Electron Devices, 1989, 36, (10), pp. 2093-2104
-
(1989)
IEEE Trans. Electron Devices
, vol.36
, Issue.10
, pp. 2093-2104
-
-
King, C.A.1
Hoyt, J.L.2
Gibbons, J.F.3
-
11
-
-
0027677701
-
Minority-carrier transport parameters in heavily doped p-type silicon at 296 and 77K
-
LEU, I.-Y., and NEUGROSCHEL, A.: 'Minority-carrier transport parameters in heavily doped p-type silicon at 296 and 77K', IEEE Trans. Electron Devices, 1993, 40, (10), pp. 1872-1875
-
(1993)
IEEE Trans. Electron Devices
, vol.40
, Issue.10
, pp. 1872-1875
-
-
Leu, I.-Y.1
Neugroschel, A.2
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