Fluorination of graphite surface using electron cyclotron resonance plasma

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 60, Issue 6, 1996, Pages 595-599

  Kotera, Koichi ^a   Tanaka, Hiroyoshi ^a   Uchida, Masao ^a   Hirao, Takashi ^b   Iwamoto, Nobuya ^c  

^a PANASONIC CORPORATION   (Japan)

^b Matsushita Technoresearch Inc   (Japan)

^c Ion Engineering Institute Corporation   (Japan)

Author keywords

Contact angle; Electron cyclotron resonance; Fluorinated carbon; Fluorination; Graphite; Plasma; Self bias voltage; Surface; Tetrafluoromethane

Indexed keywords

CARBON; ELECTRON CYCLOTRON RESONANCE; FLUORINE; PLASMA APPLICATIONS; SURFACE TREATMENT; X RAY SPECTROSCOPY;

CONTACT ANGLE; FLUORINATED CARBON; FLUORINATION; SELF BIAS VOLTAGE;

GRAPHITE;

EID: 0030173353     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.60.6_595     Document Type: Article

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