Structural and electrical investigation of implantation damage annealing in CdTe

Semiconductor Science and Technology

Volumn 11, Issue 6, 1996, Pages 947-951

  Achtziger, N ^a   Bollmann, J ^b   Licht, Th ^a   Reinhold, B ^b   Reislohner U ^a   Rohrich J ^b   Rub M ^a   Wienecke, M ^b   Witthuhn, W ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b HUMBOLDT UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CADMIUM; CRYSTAL DEFECTS; DIFFUSION; ION IMPLANTATION; SEMICONDUCTING TELLURIUM COMPOUNDS;

SEMICONDUCTING CADMIUM COMPOUNDS;

EID: 0030173281     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/11/6/017     Document Type: Article

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