SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 47, Issue 6-8, 1996, Pages 853-856

Angular distribution of mass flux from arc-like Ti vapor plasma

(3) Kajioka, H a Higuchi, K a Nakasone, M b

a Western Hiroshima Prefecture Industrial Research Institute (Japan)

b Shinko Seiki Co Ltd (Japan)

Author keywords

Ion plating; Physical vapor deposition; Plasma processing and deposition; Titanium

Indexed keywords

CRYSTAL ORIENTATION; CURRENT DENSITY; DENSIFICATION; ELECTRON BEAMS; EVAPORATION; ION BOMBARDMENT; IONIZATION; METALLIC FILMS; MORPHOLOGY; PLASMA APPLICATIONS; TITANIUM; VACUUM APPLICATIONS;

ANGULAR DISTRIBUTION; ARC LIKE DISCHARGE EVAPORATION; FARADAY CUP DISTANCE; ION CURRENT DENSITY; ION FLUXES; ION PLATING; MASS FLUXES; PHYSICAL VAPOR DEPOSITION; PLASMA PROCESSING; VACUUM EVAPORATION;

VAPOR DEPOSITION;

EID: 0030172803 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/0042-207x(96)00081-4 Document Type: Article

Times cited : (3)

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