Microgap gas chamber studies

IEEE Transactions on Nuclear Science

Volumn 43, Issue 3 PART 2, 1996, Pages 1227-1231

  Cho, H S ^a   Hong, W S ^a   Palaio, N ^a   Kadyk, J ^a   Luk, K B ^a,b   Perez Mendez, V ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGING OF MATERIALS; AMORPHOUS MATERIALS; ANODES; CATHODES; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC DISCHARGES; HYDROGENATION; PLASMA APPLICATIONS; SILICA; SILICON CARBIDE; THERMAL INSULATING MATERIALS;

ANODE STRIP; HYDROGENATED AMORPHOUS SILICON CARBIDE; MICROGAP GAS CHAMBER; MICROGAP GAS CHAMBERS;

RADIATION DETECTORS;

EID: 0030172705     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.506668     Document Type: Article

References (13)

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2. A. Oed, "Position-Sensitive Detector with Microstrip Anode for Electron Multiplication with Gases," Nucl. Instr. Meth., A263 (1988) 351.
3. See also A. Oed, "Properties of micro-strip gas chambers (MSGC) and recent developments," Nucl. Instr. Meth., A367 (1995) 34.
4. F. Angelini et al, "Further test and development of the micro-gap chamber," Nucl. Instr. Meth., A349 (1994) 412.
5. J. J. Licari, Multichip Module Design, Fabrication, and Testing, Mcgraw Hill publisher, 1995.
6. F. Angelini et al, "A large area, high gain Micro-Gap Chamber," Nucl. Instr. Meth., A362 (1995) 273.
7. W. S. Hong et al, "Microstrip Gas Chambers Fabrication Based on Amorphous Silicon and Its Carbon Alloy," Presented at IEEE Nucl. Sci. Symp., San Francisco, CA, October 21-27, 1995.
8. R. Bellazzini et al, "Electric field, avalanche growth and signal development in Micro-Strip Gas Chamber and Micro-Gap Chamber," INFN PI/AE-94/02, Submitted to La Rivista del Nuovo Cimento, 1994. See Fig. 2.31, p.42.
9. W. S. Hong et al, "Utilization of Amorphous Silicon Carbide (a-Si;C:H) as a Resistive Layer in Gas Microstrip Detector," Presented at Mat. Res. Soc. Symp., San Francisco, CA, April 17-21, 1995.
10. W. G. Gong et al, "Microstrip Gas Chamber on Thin-Film Pestov Glass and Micro Gap Chamber," Presented at the 6th Pisa Meeting on Advanced Detectors, LaBiodola, Isola d'Elba, Italy, May 22-28, 1994.
11. X-ray technologies, Inc. (X-tech), X-tech Tube Model 1303 AC-01B, operated at 0.2mA (max.) and 4-30 kV. X-Tech is now owned by Oxford Instruments, Scotts Vally, CA 95066, USA.
12. R. Bouclier et al, "Effects of outgassing from some materials on gas chamber ageing," Nucl. Instr. Meth., A350 (1994) 464.
13. R. Bouclier et al, "Aging studies with microstrip gas chambers," Nucl. Instr. Meth., A348 (1994) 109.