Appearance of resistance minimum in nanocrystalline films prepared by gas deposition method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 6 SUPPL. A, 1996, Pages 3583-3584

  Iwamoto, Yoji ^a   Kashuu, Seiichirou ^b   Sasaki, Yuji ^c   Kita, Eiji ^c   Tasaki, Akira ^c  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b Vacuum Metallurgical Co Ltd   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Electric resistance; Gas deposition; Nanocrystal

Indexed keywords

DEPOSITION; ELECTRIC RESISTANCE; EVAPORATION; GASES; LOW TEMPERATURE PROPERTIES; MOSSBAUER SPECTROSCOPY; OXIDES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SURFACES; X RAY ANALYSIS; X RAY DIFFRACTION;

ELECTRON HOPPING; GAS DEPOSITION METHOD; IRON NANOCRYSTALLINE MATERIALS;

NANOSTRUCTURED MATERIALS;

EID: 0030172598     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.3583     Document Type: Article

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