Surface morphology control of YBa2Cu2Ox thin films grown by metalorganic chemical vapor deposition using vicinal SrTiO3 substrates

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 6 SUPPL. A, 1996, Pages 3388-3391

  Zama, Hideaki ^a  

^a SUPERCONDUCTIVITY RESEARCH LABORATORY   (Japan)

Author keywords

Atomic force microscopy (AFM); Metalorganic chemical vapor deposition (MOCVD); Migration length; SrTiO3(100); Terrace width; Vicinal substrate; YBa2Cu3Ox

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR ORIENTATION; MORPHOLOGY; OXIDE SUPERCONDUCTORS; STRONTIUM COMPOUNDS; SURFACE ROUGHNESS; SURFACES;

MIGRATION LENGTH; MISORIENTATION; SURFACE MORPHOLOGY CONTROL; TERRACE WIDTH; VICINAL SUBSTRATES;

SUPERCONDUCTING FILMS;

EID: 0030172595     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.3388     Document Type: Article

References (5)

1. H. Zama, J. Saga, T. Hattori and S. Oda: Mater. Res. Soc. Symp. Proc. 335 (1994) 291.
2. K. Endo: Ext. Abstr. 1995 Int. Workshop on Superconductivity, Maui, 1995, p. 118.
3. S.Oda, H. Zama and S. Yamamoto: J. Cryst. Growth 145 (1994) 232.
4. M. Matsubara, T. Morishita and I. Hirabayashi: Appl. Phys. Lett. 64 (1994) 1868.
5. J-P. Locquet, A. Catana, E. Machler, C. Gerber and J. G. Bednorz: Appl. Phys. Lett. 64 (1994) 372.