Characterization of pit morphology of sputtered Al-1wt.%Si-0.5wt.%Cu alloy thin film

Thin Solid Films

Volumn 279, Issue 1-2, 1996, Pages 7-10

  Orr, Seung Jin ^a   Pyun, Su Il ^a   Nam, Soo Woo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Aluminium oxide; Auger electron spectroscopy (AES); Scanning electron microscopy (SEM); Sputtering

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BAND STRUCTURE; CHARACTERIZATION; CORROSION; FILM GROWTH; MORPHOLOGY; OPTICAL MICROSCOPY; PITTING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SPUTTERING; THIN FILMS;

ALUMINUM SILICON COPPER ALLOY; PIT INITIATION; PIT MORPHOLOGY; POTENTIODYNAMIC POLARIZATION MEASUREMENT;

ALUMINUM ALLOYS;

EID: 0030171391     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08778-0     Document Type: Article

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