Manufacturing of high aspect ratio micro structures using UV sensitive photopolymer

JSME International Journal, Series C: Dynamics, Control, Robotics, Design and Manufacturing

Volumn 39, Issue 2, 1996, Pages 387-396

  Yamaguchi, Katsumi ^a   Nakamoto, Takeshi ^a   Abraha, Petros ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Absorption; Diffraction; Machine Element; Micro Machining; Nontraditional Machining; Optical Engineering; Photopolymer; UV Laser Beam

Indexed keywords

DIFFRACTION; IRRADIATION; LASER BEAM EFFECTS; LIGHT ABSORPTION; MASKS; OPTICAL ENGINEERING; OPTICAL MATERIALS; PHOTOLITHOGRAPHY; POLYMERS; SEMICONDUCTOR MATERIALS; ULTRAVIOLET RADIATION; X RAYS;

HIGH ASPECT RATIO MICROSTRUCTURES; MASK BASED METHOD; MICROMECHANICAL PARTS; ULTRAVIOLET LASER BEAM; ULTRAVIOLET SENSITIVE PHOTOPOLYMER;

MICROELECTROMECHANICAL DEVICES;

EID: 0030170486     PISSN: 13408062     EISSN: None     Source Type: Journal    
DOI: 10.1299/jsmec1993.39.387     Document Type: Article

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