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Volumn 17, Issue 6, 1996, Pages 270-272
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Highly rectifying Au-contacts on diamond-on-silicon substrate
a
c
IEEE
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CURRENT DENSITY;
DIAMOND FILMS;
ELECTRIC BREAKDOWN;
ELECTRIC FIELD EFFECTS;
FILM GROWTH;
NUCLEATION;
POINT CONTACTS;
SEMICONDUCTING BORON;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
AC BIAS NUCLEATION;
BREAKDOWN FIELD STRENGTH;
GOLD CONTACTS;
IMPEDANCE ANALYZER;
MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;
RECTIFICATION RATIOS;
SCHOTTKY BARRIER DIODES;
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EID: 0030169661
PISSN: 07413106
EISSN: None
Source Type: Journal
DOI: 10.1109/55.496454 Document Type: Article |
Times cited : (8)
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References (8)
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