The influence of surface kinetics in modelling chemical vapour deposition processes in porous preforms

Journal of Materials Science

Volumn 31, Issue 11, 1996, Pages 3021-3033

  Dekker, J P ^a,b   Moene, R ^a   Schoonman, J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL MODELS; POROUS MATERIALS; REACTION KINETICS; SURFACE PHENOMENA; TITANIUM NITRIDE;

ISOTHERMAL CHEMICAL VAPOR INFILTRATION; SURFACE KINETICS;

CHEMICAL VAPOR DEPOSITION;

EID: 0030169304     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00356018     Document Type: Article

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