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Volumn 43, Issue 6, 1996, Pages 898-903

An efficient method for characterizing time-evolutional interface state and its correlation with the device degradation in LDD n-MOSFET's

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION THEORY; ELECTRIC CURRENTS; ELECTRONS; HOT CARRIERS; MATHEMATICAL MODELS; SEMICONDUCTOR DEVICE TESTING;

EID: 0030167812     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.502121     Document Type: Article
Times cited : (11)

References (15)
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    • Hofmann, K.R.1    Werner, C.2    Weber, W.3    Dorda, G.4
  • 2
    • 0020797242 scopus 로고
    • Effects of hot-carrier trapping in n- And p-channel MOSFET's
    • K. K. Ng and G. W. Taylor, "Effects of hot-carrier trapping in n- and p-channel MOSFET's," IEEE Trans. Electron Devices, vol. ED-30, p. 871, 1983.
    • (1983) IEEE Trans. Electron Devices , vol.30 ED , pp. 871
    • Ng, K.K.1    Taylor, G.W.2
  • 3
    • 0024124856 scopus 로고
    • Consistent model for the hot-carrier degradation in n-channel and p-channel MOSFET's
    • P. Heremans. R. Bellens, G. Groeseneken, and H. E. Maes, "Consistent model for the hot-carrier degradation in n-channel and p-channel MOSFET's," IEEE Trans. Electron Devices, vol. 35, p. 2194, 1988.
    • (1988) IEEE Trans. Electron Devices , vol.35 , pp. 2194
    • Heremans, P.1    Bellens, R.2    Groeseneken, G.3    Maes, H.E.4
  • 5
    • 0016927294 scopus 로고
    • The use of charge pumping currents to measure surface state densities in MOS transistors
    • A. B. M. Elliot, "The use of charge pumping currents to measure surface state densities in MOS transistors," Solid State Electron., vol. 19, p. 241, 1976.
    • (1976) Solid State Electron. , vol.19 , pp. 241
    • Elliot, A.B.M.1
  • 6
    • 33746935859 scopus 로고
    • Determination of trapped oxide charge in FLASH EPROM's and MOSFET's with thin oxides
    • [6| K. T. San and T.-P. Ma, "Determination of trapped oxide charge in FLASH EPROM's and MOSFET's with thin oxides," IEEE Electron Device Lett., vol. 11, p. 4M, 1992.
    • (1992) IEEE Electron Device Lett. , vol.11
    • San, K.T.1    Ma, T.-P.2
  • 7
    • 33746946231 scopus 로고
    • Stanford Univ., Stanford, CA.
    • M. I,aw and R. W. Dutton, SUPREMIV, Stanford Univ., Stanford, CA. 1987.
    • (1987) SUPREMIV
    • Iaw, M.1    Dutton, R.W.2
  • 8
    • 0024705114 scopus 로고
    • Analysis of the charge pumping technique and its application for the evaluation of MOSFET degradation
    • P. Heremans, J. Witters, G. Groeseneken, and H. E. Maes, "Analysis of the charge pumping technique and its application for the evaluation of MOSFET degradation," IEEE Trans. Electron Devices, vol. 36, p. 1318, 1989.
    • (1989) IEEE Trans. Electron Devices , vol.36 , pp. 1318
    • Heremans, P.1    Witters, J.2    Groeseneken, G.3    Maes, H.E.4
  • 9
    • 0027680606 scopus 로고
    • A new charge pumping method for determining the spatial distribution of hot carrier induced fixed charge in p-MOSFET' s
    • [91 M. Tsuchiaki, H. Hara, T. Morimoto, and H. Iwai, "A new charge pumping method for determining the spatial distribution of hot carrier induced fixed charge in p-MOSFET' s," IEEE Trans. Electron Devices. vol. 40, p. 1768, 1993.
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    • Tsuchiaki, M.1    Hara, H.2    Morimoto, T.3    Iwai, H.4
  • 11
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    • Lateral profiling of oxide charge and interface traps near MOSFET junctions
    • [Ill W. Chcn, A. Balasinski, and T.-P. Ma, "Lateral profiling of oxide charge and interface traps near MOSFET junctions," IEEE Trans. Electron Devices, vol. 40, p. 187, 1993.
    • (1993) IEEE Trans. Electron Devices , vol.40 , pp. 187
    • Chcn, I.W.1    Balasinski, A.2    Ma, T.-P.3
  • 14
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    • Lateral distribution of hot-carrier-indnced interface traps in MOSFET's
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.