Applications of nuclear microprobes in the semiconductor industry

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 113, Issue 1-4, 1996, Pages 330-335

  Takai, M ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENT MEASUREMENT; ELECTRONICS INDUSTRY; ION BEAMS; ION SOURCES; NANOTECHNOLOGY; RADIATION EFFECTS; RANDOM ACCESS STORAGE; RELIABILITY; SEMICONDUCTOR DEVICES;

DYNAMIC RANDOM ACCESS MEMORIES; ION BEAM INDUCED CURRENTS; LIQUID METAL ION SOURCES; NANOPROBES; NUCLEAR MICROPROBES; RELIABILITY TESTING; SEMICONDUCTOR INDUSTRY; SOFT ERROR MAPPING;

OPTICAL DEVICES;

EID: 0030166691     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01350-4     Document Type: Article

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