Polarization-dependent angular reflectance of silicon and germanium in the infrared

Infrared Physics and Technology

Volumn 37, Issue 4, 1996, Pages 539-546

  Zhang, Z M ^a   Hanssen, L M ^a   Datla, R U ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Infrared; Oblique incidence; Optical properties; Polarization; Reflectance

Indexed keywords

CRYSTALLINE MATERIALS; INFRARED RADIATION; LIGHT POLARIZATION; NUMERICAL ANALYSIS; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; REFLECTOMETERS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SPECTROMETERS;

ANGLE OF INCIDENCE; REFLECTANCE; STANDARD REFERENCE MATERIALS; WAVELENGTH;

FOURIER TRANSFORM INFRARED SPECTROSCOPY;

EID: 0030166135     PISSN: 13504495     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1350-4495(95)00118-2     Document Type: Article

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