Interfacial improvement of XLPE cable insulation at reduced thickness

IEEE Transactions on Dielectrics and Electrical Insulation

Volumn 3, Issue 3, 1996, Pages 345-350

  Tanaka, T ^a   Okamoto, T ^a   Hozumi, N ^a   Suzuki, K ^a  

^a CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CRYSTAL ORIENTATION; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC CABLES; ELECTRIC INSULATION; FREE ENERGY; INTERFACES (MATERIALS); SEMICONDUCTING FILMS;

CABLE INSULATION; CROSSLINKED POLYETHYLENES; INSULATION THICKNESS; LAMELLAR GROWTH;

POLYETHYLENES;

EID: 0030165885     PISSN: 10709878     EISSN: None     Source Type: Journal    
DOI: 10.1109/94.506205     Document Type: Article

References (7)

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2. T. Kubota, Y. Takahashi, T. Hasegawa, H. Noda, M. Yamaguchi and M. Tan, "Development of 500 kV XLPE Cables and Accessories for Long Distance Underground Transmission Line - Part II: Jointing Techniques - ", IEEE Trans. on Power Delivery, Vol. 9, No. 4, pp. 1750-1756, October, 1994.
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7. T. Okamoto, M. Ishida and N. Hozumi, "Dielectric Breakdown Strength Affected by the Lamellar Configuration in XLPE Insulation at a Semiconducting Interface", IEEE Trans. on El. Ins. Vol. 24, No. 4, pp. 599-607, August, 1989.