Adsorption reactions of Ti/Si(001) by variable-temperature STM

Surface Science

Volumn 357-358, Issue , 1996, Pages 28-31

  Ishiyama, Kengo ^c   Taga, Yasunori ^a   Ichimiya, Ayahiko ^b  

^a Rd Management Section   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c NONE

Author keywords

Atom solid interactions; Atom solid reactions; Diffusion and migration; Growth; Scanning tunneling microscopy; Silicon; Surface diffusion; Titanium

Indexed keywords

CHEMICAL BONDS; DIFFUSION IN SOLIDS; GROWTH (MATERIALS); SCANNING TUNNELING MICROSCOPY; SILICON; SURFACE MEASUREMENT; SURFACE PHENOMENA; SURFACE TREATMENT; TITANIUM;

ATOM SOLID INTERACTIONS; ATOM SOLID REACTION; DIMER RECONSTRUCTION; MONATOMIC ADSORPTION; SITE CONVERSION; SURFACE DIFFUSION; VACANCY SITE ADSORPTION; VARIABLE TEMPERATURE SCANNING TUNNELING SPECTROSCOPY;

ADSORPTION;

EID: 0030165437     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00051-9     Document Type: Article

References (8)

1. P.A. Bennett, S.A. Prikh and D. Cahill, J. Vac. Sci. Technol. A 11 (1993) 1680.
2. R.J. Wilson and S. Chiang, Phys. Rev. Lett. 58 (1987) 2575.
3. J.A. Kubby and W.J. Greene, J. Vac. Sci. Technol. A 12 (1994) 2009.
4. P.A. Bennett, D. Cahill and M. Copel, Phys. Rev. Lett. 73 (1994) 452.
5. M.D. Giudice, J.J. Joyce, M.W. Ruckmann and J.H. Weaver, Phys. Rev. B 35 (1987) 6213.
6. X. Wallart, J.P. Nys, H.S. Zeng, G. Dalmai, I. Lefebvre and M. Lannoo, Phys. Rev. B 41 (1990) 3087.
7. K. Ishiyama, Y. Taga and A. Ichimiya, Phys. Rev. B 51 (1995) 2380.
8. Atomic and Nanometer-Scale Modification of Materials: Fundamentals and Applications, Ed. P. Avouris (Kluwer, Dordrecht, 1993).