A calibrated scanning tunneling microscope equipped with capacitive sensors

Review of Scientific Instruments

Volumn 67, Issue 6, 1996, Pages 2274-2280

  Holman, A E ^a   Laman, C D ^a   Scholte, P M L O ^a   Heerens, W Chr ^a   Tuinstra, F ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; CAPACITORS; FEEDBACK CONTROL; HYSTERESIS; IMAGE ANALYSIS; PIEZOELECTRICITY; POSITION MEASUREMENT; SCANNING TUNNELING MICROSCOPY; SENSORS; SURFACES;

CAPACITIVE SENSORS; PIEZOELECTRIC VOLTAGES; SCANNING TUNNELING MICROSCOPES; TUBE SCANNERS;

MICROSCOPES;

EID: 0030164733     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1147046     Document Type: Article

References (26)

1. J. Jahanmir, B. G. Haggar, and J. B. Hayes, Scanning Microsc. 6, 625 (1992).
2. A. E. Holman, W. Chr. Heerens, and F. Tuinstra, Sensors Actuators A 36, 37 (1993).
3. A. E. Holman, P. M. L. O. Scholte, W. Chr. Heerens, and F. Tuinstra, Rev. Sci. Instrum. 66, 3208 (1995).
4. L. Libioulle, A. Ronda, M. Taborelli, and J. M. Gilles, J. Vac. Sci. Technol. B 9, 655 (1991).
5. L. E. C. van de Leemput, P. H. H. Rongen, B. H. Timmerman, and H. van Kempen, Rev. Sci. Instrum. 62, 989 (1991).
6. K. G. Vandervoort, R. K. Zasadzinski, G. G. Galicia, and G. W. Crabtree, Rev. Sci. Instrum. 64, 896 (1993).
7. S. Vieira, IBM J. Res. Devel. 30, 553 (1986).
8. R. W. Basedow and T. D. Cocks, J. Phys. E 13, 840 (1980).
9. S. M. Hues, C. F. Draper, K. P. Lee, and R. J. Colton, Rev. Sci. Instrum. 65, 1561 (1994).
10. J. E. Griffith and D. A. Grigg, J. Appl. Phys. 74, R83 (1993).
11. J. F. Jørgensen, L. L. Madsen, J. Garnaes, K. Carneiro, and K. Schaumburg, J. Vac. Sci Technol. B 12, 1698 (1994).
12. J. F. Jørgensen, K. Carneiro, L. L. Madsen, and K. Conradsen, J. Vac. Sci Technol. B 12, 1702 (1994).
13. J. F. Jørgensen, K. Carneiro, and L. L. Madsen, Nanotechnol. 4, 152 (1993).
14. S. Carrara, P. Facci, and C. Nicolini, Rev. Sci. Instrum. 65, 2860 (1994).
15. E. P. Stoll, Rev. Sci. Instrum. 65, 2864 (1994).
16. V. Yu. Yurov and A. N. Klimov, Rev. Sci. Instrum. 65, 1551 (1994).
17. Patent pending.
18. Burleigh Instruments, Inc., Burleigh Park, Fishers, NY 14453.
19. PI Physik Instrumente GmbH & Co., Waldbronn, Germany. Type P178.20 with UHV option.
20. R. C. Barrett and C. F. Quate, Rev. Sci. Instrum. 62, 1393 (1991).
21. D. K. Bowen, D. G. Chetwynd, and D. R. Schwarzenberger, Meas. Sci. Technol. 1, 107 (1990).
22. J. E. Griffith, G. L. Miller, C. A. Green, D. A. Grigg, and P. E. Russell, J. Vac. Sci. Technol. B 8, 2023 (1990).
23. S. Desogus, S. Lanyi, R. Nerino, and G. B. Picotto, J. Vac. Sci. Technol. B 12, 1665 (1994).
24. O. Jusko, X. Zhao, H. Wolff, and G. Wilkening, Rev. Sci. Instrum. 65, 2514 (1994).
25. W. Chr. Heerens, J. Phys. E 19, 897 (1986).
26. Fabricated at the Philips Research Laboratory, Eindhoven, the Netherlands.