Etching of r.f. magnetron-sputtered indium tin oxide films

Journal of Materials Science: Materials in Electronics

Volumn 7, Issue 3, 1996, Pages 241-246

  Chiou, B I Shiou ^a   Lee, Jen Huang ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ELECTROOPTICAL EFFECTS; ETCHING; GRAIN BOUNDARIES; HYDROCHLORIC ACID; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; SEMICONDUCTING TIN COMPOUNDS; SOLUTIONS; SURFACE STRUCTURE;

INDIUM TIN OXIDE; PINHOLES;

THIN FILMS;

EID: 0030164664     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00133122     Document Type: Article

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