Photoassisted liquid-phase deposition of silicon dioxide

Journal of the Electrochemical Society

Volumn 143, Issue 6, 1996, Pages 2044-2048

  Huang, Chen Tang ^a   Chang, Peng Heng ^a   Shie, Jin Shown ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; INORGANIC ACIDS; LIGHT ABSORPTION; MATHEMATICAL MODELS; SILICON WAFERS; SUBSTRATES; SURFACE CLEANING; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTROSCOPY;

BORIC ACID; HYDROFLUOSILICIC ACID; LIQUID PHASE DEPOSITION; PHOTOENHANCEMENT EFFECT;

SILICA;

EID: 0030163949     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836946     Document Type: Article

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