X-ray and ultraviolet photoemission study of the formation and band lineup of C60/Si(111) interface

Solid State Communications

Volumn 98, Issue 5, 1996, Pages 417-419

  Zhu, Jing Sheng ^a   Liu, Xian Ming ^a   Xu, Shi Hong ^a   Wu, Jian Xin ^a   Sun, Xue Feng ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

D. band lineup; D. rigid shift; D. work function; E. photoelectron spectroscopy

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CLEANING; FULLERENES; HETEROJUNCTIONS; PHOTOEMISSION; SILICON WAFERS; SPUTTERING; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

BAND LINEUP; CORE LEVEL RIGID SHIFT; FULLERENE SILICON INTERFACE; INTERFACE FORMATION; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; VALENCE BAND; WORK FUNCTION;

INTERFACES (MATERIALS);

EID: 0030151375     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1098(96)00073-7     Document Type: Article

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