Ion beam mixing, diffusion, and phase stability in Cu/Al2O3 interfaces

Journal of Materials Research

Volumn 11, Issue 5, 1996, Pages 1277-1283

  Neubeck, K ^a   Hahn, H ^a   Balogh, A G ^a   Baumann, H ^b   Bethge, K ^b   Ruck D M ^c   Angert, N ^c  

^a Technical University   (Germany)

^b GOETHE UNIVERSITY   (Germany)

^c Centre for Heavy Ion Research   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; COPPER; DIFFUSION IN SOLIDS; ENTHALPY; ION BEAMS; IRRADIATION; PHASE EQUILIBRIA; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; VAPOR DEPOSITION;

DEFECT CONCENTRATION; DEFECT MOBILITY; ION BEAM MIXING; MIGRATION ENTHALPY; PHASE STABILITY; PRIMARY KNOCK ON ATOMS; RADIATION ENHANCED DIFFUSION;

INTERFACES (MATERIALS);

EID: 0030151259     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0162     Document Type: Article

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