Structural and optical properties of R.F. sputtered Bi2VO5.5 thin films

Solid State Communications

Volumn 98, Issue 6, 1996, Pages 535-538

  Viswanathan, M ^a   Thutupalli, G K M ^a   Varma, K B R ^b  

^a INDIAN SPACE RESEARCH ORGANISATION   (India)

^b INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

A. thin films; C. scanning and transmission electron microscopy; D. optical properties

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CHARACTERIZATION; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING BISMUTH COMPOUNDS; SILICON; SPUTTERING; STRUCTURE (COMPOSITION); TRANSMISSION ELECTRON MICROSCOPY;

BISMUTH VANADATE; EXTINCTION COEFFICIENT; OPTICAL BANDGAP; RADIOFREQUENCY SPUTTERING; STRUCTURAL PROPERTIES;

THIN FILMS;

EID: 0030151151     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1098(96)00097-X     Document Type: Article

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