UV-sensitive polyarylates as photolithographic emulsions

Journal of Applied Polymer Science

Volumn 60, Issue 7, 1996, Pages 1071-1082

  Noniewicz, Konrad ^a   Brzozowski, Zbigniew K ^a   Zadrozna, Irmina ^a  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PROPERTIES; EMULSIONS; INFRARED SPECTROSCOPY; MECHANICAL PROPERTIES; MONOMERS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTOLITHOGRAPHY; POLYCONDENSATION; STRUCTURE (COMPOSITION); ULTRAVIOLET SPECTROSCOPY;

BISBENZYLIDENOKETONES; INTERFACIAL POLYCONDENSATION; PHOTOLITHOGRAPHIC EMULSION; ULTRAVIOLET SENSITIVE POLYARYLATES;

POLYESTERS;

EID: 0030150971     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4628(19960516)60:7<1071::AID-APP19>3.0.CO;2-3     Document Type: Article

References (14)

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