Effect of TiO2 doping on rapid densification of alumina by plasma activated sintering

Journal of Materials Research

Volumn 11, Issue 5, 1996, Pages 1144-1148

  Mishra, R S ^a   Mukherjee, A K ^a   Yamazaki, K ^a   Shoda, K ^b  

^a University of California   (United States)

^b Sodick Future Technologies Co   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DENSIFICATION; DIELECTRIC PROPERTIES; DOPING (ADDITIVES); GRAIN GROWTH; GRAIN SIZE AND SHAPE; PLASMA APPLICATIONS; REACTION KINETICS; SINTERING; TITANIUM DIOXIDE;

MULTIPLE PLASMA CYCLE; PLASMA ACTIVATED SINTERING; PLASMA CYCLE; RAPID DENSIFICATION; SINTERING KINETICS;

ALUMINA;

EID: 0030150484     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0147     Document Type: Article

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