Methods for measurement of development parameters in the manufacturing line for use in photolithography modeling

IEEE Transactions on Semiconductor Manufacturing

Volumn 9, Issue 2, 1996, Pages 182-190

  Fahey, Kevin P ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DATA ACQUISITION; MAGNETIC HEADS; MAGNETIC THIN FILMS; MEASUREMENTS; PHOTOLITHOGRAPHY;

DEVELOPMENT PARAMETERS; MANUFACTURING LINE; PHOTOLITHOGRAPHY MODELING; PRODUCTION EQUIPMENT; STANDING WAVES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030150382     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.492812     Document Type: Article

References (19)

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