Surface studies by means of 45° reflectometry

Surface Science

Volumn 351, Issue 1-3, 1996, Pages 277-284

  Bleckmann, L ^a   Hunderi, O ^a   Richter, W ^b   Wold, E ^a  

^a NORWEGIAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Norway)

^b TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

Reflection spectroscopy; Silicon; Silver; Surface relaxation and reconstruction; Surface structure, morphology, roughness, and topography

Indexed keywords

ANISOTROPY; MORPHOLOGY; SEMICONDUCTING SILICON; SILVER; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS;

REFLECTION SPECTROSCOPY; REFLECTOMETRY; SURFACE RECONSTRUCTION; SURFACE RELAXATION; SURFACE TOPOGRAPHY;

THIN FILMS;

EID: 0030149837     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01268-0     Document Type: Article

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