Influence of oxygen partial pressure and heat treatment on the properties of reactively sputtered in2O3 films

Physica Status Solidi (A) Applied Research

Volumn 155, Issue 1, 1996, Pages 115-123

  Jayaraj, M K ^a,b   Loreti, S ^a   Agati, A ^a   Parretta, A ^a  

^a ENEA   (Italy)

^b Department of Physics   (India)

Author keywords

[No Author keywords available]

Indexed keywords

INDIUM COMPOUNDS; OPTICAL PROPERTIES; OXIDATION; OXIDES; SPUTTER DEPOSITION; SPUTTERING;

INDIUM OXIDE; INDIUM OXIDE FILMS; TRANSPARENT CONDUCTIVE OXIDE;

CONDUCTIVE FILMS;

EID: 0030149759     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.2211550110     Document Type: Article

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