Removal of metal and organic contaminants from silicon substrates using electrolysis-ionized water containing ammonium chloride

Journal of the Electrochemical Society

Volumn 143, Issue 5, 1996, Pages 1632-1635

  Shiramizu, Yoshimi ^a   Watanabe, Kaori ^a   Tanaka, Masaru ^a   Aoki, Hidemitsu ^a   Kitajima, Hiroshi ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; DECOMPOSITION; ELECTROLYSIS; HYDROGEN PEROXIDE; IMPURITIES; INORGANIC ACIDS; IONIZATION; METALS; ORGANIC COMPOUNDS; SEMICONDUCTING SILICON; SPECTROSCOPY; WATER;

AMMONIUM CHLORIDE; AMMONIUM HYDROXIDE; ELECTROLYSIS IONIZED WATER; OXIDATION REDUCTION POTENTIAL;

ELECTROLYTIC CLEANING;

EID: 0030149078     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836690     Document Type: Article

References (10)

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