Isolated submicrometer filaments formed by silicon anodization in HF solutions

Journal of the Electrochemical Society

Volumn 143, Issue 5, 1996, Pages

  Teschke, O ^a   Scares, D M ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; ELECTROCHEMICAL ELECTRODES; ETCHING; HYDROFLUORIC ACID; HYDROGEN; METALLOGRAPHIC MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; POROUS SILICON; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTROCHEMICAL CELLS; NANOCOLUMN FORMATION; NANOPORES; SILICON ANODIZATION; SUBMICROMETER FILAMENTS;

ANODIC OXIDATION;

EID: 0030149077     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836665     Document Type: Article

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