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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 5 SUPPL. A, 1996, Pages 2803-2807

Electron cyclotron wave plasma production using a concave lens

(3) Sugimoto, Masaya a Tanaka, Masayoshi b Kawai, Yoshinobu a

a KYUSHU UNIVERSITY (Japan)

b NATIONAL INSTITUTE FOR FUSION SCIENCE (Japan)

Author keywords

ECR plasma; Electron cyclotron wave; Field profile control; Microwave concave lens

Indexed keywords

CARRIER CONCENTRATION; DAMPING; ELECTRON LENSES; ELECTRONS; MICROWAVE DEVICES; PLASMA DENSITY; PLASMA ETCHING; PRESSURE EFFECTS; REFRACTIVE INDEX; TEMPERATURE; WAVE PLASMA INTERACTIONS;

ELECTRON CYCLOTRON WAVE PLASMA PRODUCTION; FAST DAMPING; FIELD PROFILE CONTROL; HIGH PRESSURE OPERATION; MICROWAVE CONCAVE LENS;

ELECTRON CYCLOTRON RESONANCE;

EID: 0030149011 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.35.2803 Document Type: Article

Times cited : (7)

References (13)

1
- 0021479595
- T. Ono, C. Takahashi and S. Matsuo: Jpn. J. Appl. Phys. 23 (1984) L534.
- (1984) Jpn. J. Appl. Phys. , vol.23
- Ono, T.¹ Takahashi, C.² Matsuo, S.³

2
- 0024627931
- M. Matsuoka and K. Ono: Jpn. J. Appl. Phys. 28 (1989) L503.
- (1989) Jpn. J. Appl. Phys. , vol.28
- Matsuoka, M.¹ Ono, K.²

3
- 36549091946
- M. Matsuoka and K. Ono: J. Appl. Phys. 65 (1989) 4403.
- (1989) J. Appl. Phys. , vol.65 , pp. 4403
- Matsuoka, M.¹ Ono, K.²

4
- 0010259496
- M. Tanaka, R. Nishimoto, S. Higashi, N. Harada, T. Ohi, A. Komori and Y. Kawai: J. Phys. Soc. Jpn. 50 (1991) 1600.
- (1991) J. Phys. Soc. Jpn. , vol.50 , pp. 1600
- Tanaka, M.¹ Nishimoto, R.² Higashi, S.³ Harada, N.⁴ Ohi, T.⁵ Komori, A.⁶ Kawai, Y.⁷

5
- 3343007647
- G. Lisitano, M. Fontanesi and S. Bernabei: Phys. Rev. Lett. 26 (1971) 747.
- (1971) Phys. Rev. Lett. , vol.26 , pp. 747
- Lisitano, G.¹ Fontanesi, M.² Bernabei, S.³

6
- 0442305264
- K. Ohkubo and S. Tanaka: J. Phys. Soc. Jpn. 41 (1976) 254.
- (1976) J. Phys. Soc. Jpn. , vol.41 , pp. 254
- Ohkubo, K.¹ Tanaka, S.²

7
- 0004210536
- John Wiley and Sons, New York
- M. A. Heald and C. B. Wharton: Plasma Diagnostics with Microwaves (John Wiley and Sons, New York, 1965).
- (1965) Plasma Diagnostics with Microwaves
- Heald, M.A.¹ Wharton, C.B.²

8
- 0027578303
- M. Tanaka, M. Tamaoki, S. Higashi, M. Matsuoka, A. Komori and Y. Kawai: Jpn. J. Appl. Phys. 32 (1993) 1818.
- (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 1818
- Tanaka, M.¹ Tamaoki, M.² Higashi, S.³ Matsuoka, M.⁴ Komori, A.⁵ Kawai, Y.⁶

9
- 0028511948
- M. Tanaka, K. Nagao, H. Shoyama, M. Sugimoto and Y. Kawai: Jpn. J. Appl. Phys. 33 (1994) 5028.
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 5028
- Tanaka, M.¹ Nagao, K.² Shoyama, H.³ Sugimoto, M.⁴ Kawai, Y.⁵

10
- 84957341069
- J. E. Stevens, Y. C. Huang, R. L. Jarecki and J. L. Cecchi: J. Vac. Sci. Technol A 10 (1992) 1270.
- (1992) J. Vac. Sci. Technol A , vol.10 , pp. 1270
- Stevens, J.E.¹ Huang, Y.C.² Jarecki, R.L.³ Cecchi, J.L.⁴

11
- 0003693894
- W. A. Benjamin, Massachusetts, Chap. 5
- S. Ichimaru: Basic Principles of Plasma Physics (W. A. Benjamin, Massachusetts, 1973) Chap. 5.
- (1973) Basic Principles of Plasma Physics
- Ichimaru, S.¹

12
- 36749113984
- R. L. Stenzel: Phys. Fluids 19 (1976) 857.
- (1976) Phys. Fluids , vol.19 , pp. 857
- Stenzel, R.L.¹

13
- 3342883243
- H. Sugai and S. Takeda: Phys. Fluids 23 (1980) 194.
- (1980) Phys. Fluids , vol.23 , pp. 194
- Sugai, H.¹ Takeda, S.²

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