Optimization of the growth rate of electrochromic WO3 coatings, in-situ grown by chemical vapor deposition at atmospheric pressure

Renewable Energy

Volumn 8, Issue 1-4, 1996, Pages 546-550

  Gogova, D ^a   Stoyanov, G ^a   Gesheva, K A ^a  

^a CTRL LAB SOLAR ENER NEW ENER S   (Bulgaria)

Author keywords

Chemical vapor deposition; Electrochromic; Structure; Thin films; Transmittance; Tungsten trioxide (WO3)

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELECTROCHROMISM; FILM GROWTH; FLOW OF FLUIDS; GLASS; OXYGEN; POLYCRYSTALLINE MATERIALS; PYROLYSIS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS;

DEGREE OF TEXTURING; ELECTROCHROMIC COATINGS; GROWTH RATE; TUNGSTEN TRIOXIDE;

THIN FILMS;

EID: 0030148923     PISSN: 09601481     EISSN: None     Source Type: Journal    
DOI: 10.1016/0960-1481(96)88915-4     Document Type: Article

References (6)

1. Deb S.K.(1992). Opportunities and Challenges of Electrochromic Phenomena in Transition Metal Oxides. Solar Energy Materials and Solar Cells, 25, 327-338.
2. Granquist C.G.(1993) In series: Physics of Thin Films. Electrochromic Tungsten-Oxide-Based Thin Films: Physics, Chemistry and Technology, p.301-370.
3. Spee C.I.M.A., J.L. Linden, G. Kirchner, A.D. Kuypers, A. Mackor and H.A. Meinema. Plasma-enhanced CVD of Electrochromic Materials. Proc. of Symposium BB of MRS'95 Fall Meeting, v..415-in press;
4. 3 films. Proc. of symposium BB of MRS'95, Fall meeting, v.415 -in press.
5. Gesheva K.A. and D.S Gogova (1993). CVD-Technology of Transition Metal Oxides and Their Impact on Solar Energy Utilization. Physique-Coll.C3, Suppl.au J.de Phys. II, v.3, p.475
6. 3 as an electrochromic material. Proc. of SPIE- Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, v.2255, pp.332-339.