Control of fullerene generation through the macroscopic parameters of carbon plasma ARC

Fullerene Science and Technology

Volumn 4, Issue 3, 1996, Pages 385-397

  Huczko, A ^a   Lange, H ^a   Byszewski, P ^b,c  

^a UNIVERSITY OF WARSAW   (Poland)

^b INSTITUTE OF VACUUM TECHNOLOGY   (Poland)

^c INSTITUTE OF PHYSICS   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; ELECTRIC CURRENTS; ELECTRODES; EROSION; GRAPHITE; GRAPHITE ELECTRODES; PLASMAS; SYNTHESIS (CHEMICAL); VAPORS;

CARBON PLASMA ARC; CARBON VAPOR EXPANSION; FULLERENE GENERATION; VIABILITY;

FULLERENES;

EID: 0030148737     PISSN: 1064122X     EISSN: None     Source Type: Journal    
DOI: 10.1080/10641229608001558     Document Type: Article

References (21)

1. (a) Kroto, H. W., Angew. Chem. Int. Ed. Engl., 1992, 31, 111.
2. (b) Krätschmer, W. and Huffman, D. R., Carbon, 1992, 30, 114.
3. (c) Taylor, R. and Walton, D. R. M., Nature, 1993, 363, 685.
4. (a) Curl, R. F., Phil. Trans. R. Soc. London A, 1993, 343, 19.
5. (b) Wang, C. Z., Xu, C. H., Chan, C. T. and Ho, K. M., J. Phys. Chem., 1992, 96, 3565.
6. (c) Gao, X. and Gao, J., J. Phys. Chem., 1994, 98, 5618.
7. Lamb, L. D. and Huffman, D. R., J. Phys. Chem. Solids, 1993, 54, 1635.
8. Gray, E. W., IEEE Trans. Plasma Sci., 1978, PS-6, 384.
9. Lange, H., Byszewski, P., Huczko, A. and Ukalski, P., VDI Berichte, 1995, 1166, 325.
10. (a) Taylor, G. H., Fitz Gerald, J. D., Pang, L. and Wilson, M. A., J. Cryst. Growth, 1994, 135, 157.
11. (b) Wang, X. K., Lin, X. W., Dravid, V. P., Ketterson, J. B. and Chang, R. P. H, Appl. Phys. Lett., 1995, 66, 427.
12. Huczko, A., Lange, H. and Byszewski, P., Pol. J. Appl. Chem., 1994, 37, 475.
13. Huczko, A., Lange, H. and Byszewski, 12 Intern. Symp. on Plasma Chemistry, Massachusetts, USA, 1995, 3, 1183.
14. (a) Mieno, T., J. Phys. Soc. Jap., 1993, 62, 4146.
15. (b) Chow, L., Wang, H., Kleckley, S., Daly, T. K. and Buseck, P. R., Appl. Phys. Lett., 1995, 66, 430.
16. Scrivens, W. A. and Tour, J. M., J. Org. Chem., 1992, 57, 6932.
17. Wickens, A. J., Chem & Ind., 1976, 7, 316.
18. Baddour, R. F. and Iwasyk, J. M., Ind. Eng. Chem., Process Des. Dev., 1962, 1, 169.
19. McKelliget, J. W. and Szekely, J., J. Phys. D:Appl. Phys., 1983, 16, 1007.
20. Davies, C. and Abrahamson, J., Ind. Eng. Chem., Process Des. Dev., 1983, 22, 226.
21. Chelikovsky, J. R., Phys. Rev. Lett., 1991, 67, 2970.