|
Volumn 8, Issue 21, 1996, Pages 3843-3857
|
Structural and electronic properties of ion-beam-prepared Al1-xFex samples
|
Author keywords
[No Author keywords available]
|
Indexed keywords
BINARY ALLOYS;
ELECTRIC CONDUCTIVITY MEASUREMENT;
ELECTRON ENERGY LEVELS;
ELECTRONIC PROPERTIES;
ION BEAMS;
IRON;
IRRADIATION;
MOSSBAUER SPECTROSCOPY;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY SPECTROSCOPY;
AMORPHOUS STATE;
ATOMIC DISTRIBUTION;
CRYSTALLINE ALLOYS;
DEHYBRIDIZATION;
ELECTRONIC DISTRIBUTION;
ISOMER SHIFT VALUES;
PSEUDO-GAP;
QUASICRYSTALLINE STATE;
STRUCTURAL PROPERTIES;
ALUMINUM ALLOYS;
|
EID: 0030147909
PISSN: 09538984
EISSN: None
Source Type: Journal
DOI: 10.1088/0953-8984/8/21/011 Document Type: Article |
Times cited : (5)
|
References (21)
|