Surface composition of CVD-grown α-SiC layers - An XPS and LEED study

Applied Surface Science

Volumn 99, Issue 1, 1996, Pages 27-33

  Behner, H ^a   Rupp, R ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; COOLING; EPITAXIAL GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MIXTURES; SILICON CARBIDE; STOICHIOMETRY; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS COMPOSITION; GAS MIXTURE;

SURFACE STRUCTURE;

EID: 0030147014     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00511-0     Document Type: Article

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