-
1
-
-
0003441985
-
-
Noyes, Park Ridge, NJ
-
J. J. Licari and L. R. Enlow, Hybrid Microcircuit Technology Handbook - Materials, Processes, Design, Testing and Production; pp. 118-25. Noyes, Park Ridge, NJ, 1988.
-
(1988)
Hybrid Microcircuit Technology Handbook - Materials, Processes, Design, Testing and Production
, pp. 118-125
-
-
Licari, J.J.1
Enlow, L.R.2
-
2
-
-
0022565049
-
Firing Process-Related Failure in Thick-Film Copper Multilayers
-
R. J. Bacher and V. P. Siuta, "Firing Process-Related Failure in Thick-Film Copper Multilayers," Proc.-Electron. Compon. Conf., 471-80 (1986).
-
(1986)
Proc.-Electron. Compon. Conf.
, pp. 471-480
-
-
Bacher, R.J.1
Siuta, V.P.2
-
3
-
-
0022216492
-
Copper Thick Film Nitrogen Atmosphere Furnace Design and Firing Process Considerations
-
J. B. Bradley, "Copper Thick Film Nitrogen Atmosphere Furnace Design and Firing Process Considerations," Proc. Int. Microelectron. Symp., 435-40 (1985).
-
(1985)
Proc. Int. Microelectron. Symp.
, pp. 435-440
-
-
Bradley, J.B.1
-
4
-
-
0021540521
-
Infrared Firing of a Copper Multilayer System
-
C. L. Fisher, D. L. Hankey, E. C. Liang, B. Bertsch, and D. K. Hinkle, "Infrared Firing of a Copper Multilayer System," Proc. Int. Microelectron. Symp., 259-67 (1984).
-
(1984)
Proc. Int. Microelectron. Symp.
, pp. 259-267
-
-
Fisher, C.L.1
Hankey, D.L.2
Liang, E.C.3
Bertsch, B.4
Hinkle, D.K.5
-
5
-
-
4243185798
-
Materials Science Aspects of a Thick Film Copper/Dielectric System
-
R. D. Gardner, A. S. Shaikh, G. Sarker, and C. Bauer, "Materials Science Aspects of a Thick Film Copper/Dielectric System," Proc. Int. Microelectron. Symp., 285-94 (1990).
-
(1990)
Proc. Int. Microelectron. Symp.
, pp. 285-294
-
-
Gardner, R.D.1
Shaikh, A.S.2
Sarker, G.3
Bauer, C.4
-
6
-
-
0023672803
-
The Thermal-Cycled Adhesion of Thick-Film Copper Conductors
-
C. R. S. Needes and J. F. Knaak, "The Thermal-Cycled Adhesion of Thick-Film Copper Conductors," Proc. - Electron. Compon. Conf., 618-28 (1988).
-
(1988)
Proc. - Electron. Compon. Conf.
, pp. 618-628
-
-
Needes, C.R.S.1
Knaak, J.F.2
-
7
-
-
85033843224
-
-
"Metal Oxide-Coated Copper Powder," U.S. Pat. No. 4594 181, 1986
-
V. P. Siuta, "Metal Oxide-Coated Copper Powder," U.S. Pat. No. 4594 181, 1986.
-
-
-
Siuta, V.P.1
-
8
-
-
0022185642
-
A New Air-firable Thick Film Copper Conductor
-
C. C. Y. Kuo, "A New Air-firable Thick Film Copper Conductor," Proc. Int. Microelectron. Symp., 472-77 (1985).
-
(1985)
Proc. Int. Microelectron. Symp.
, pp. 472-477
-
-
Kuo, C.C.Y.1
-
9
-
-
4243181306
-
Adhesion of Thick Film Copper Conductors
-
C. C. Y. Kuo, "Adhesion of Thick Film Copper Conductors," Int. J. Hybrid Microelectron., 4 [2] 70-78 (1981).
-
(1981)
Int. J. Hybrid Microelectron.
, vol.4
, Issue.2
, pp. 70-78
-
-
Kuo, C.C.Y.1
-
10
-
-
4243158460
-
The Adhesion Mechanism of Copper Thick Film on Alumina Substrates
-
J. Murayama, H. Ikezaka, N. Tanifuji, and T. Kato, "The Adhesion Mechanism of Copper Thick Film on Alumina Substrates," Proc. Int. Conf. Microelectron., 303-307 (1990).
-
(1990)
Proc. Int. Conf. Microelectron.
, pp. 303-307
-
-
Murayama, J.1
Ikezaka, H.2
Tanifuji, N.3
Kato, T.4
-
11
-
-
4243194624
-
Alumina Substrate and Glass Interfacial Interactions
-
Y. Nakamura, "Alumina Substrate and Glass Interfacial Interactions," Int. J. Hybrid Microelectron., 4 [2] 168-71 (1981).
-
(1981)
Int. J. Hybrid Microelectron.
, vol.4
, Issue.2
, pp. 168-171
-
-
Nakamura, Y.1
-
12
-
-
0022565049
-
Firing Process-Related Failure in Thick-Film Copper Multilayers
-
R. J. Bacher and V. P. Siuta, "Firing Process-Related Failure in Thick-Film Copper Multilayers," Proc. ECC, 9, 471-80 (1986).
-
(1986)
Proc. ECC
, vol.9
, pp. 471-480
-
-
Bacher, R.J.1
Siuta, V.P.2
-
13
-
-
84986350141
-
Mechanisms for Char Formation in Nitrogen Fired Thick Film Materials
-
D. Whitman, "Mechanisms for Char Formation in Nitrogen Fired Thick Film Materials," Proc. Int. Microelectron. Symp., 421-25 (1988).
-
(1988)
Proc. Int. Microelectron. Symp.
, pp. 421-425
-
-
Whitman, D.1
-
14
-
-
85033868777
-
-
"Thick Film Copper Conductor Inks," U.S. Pat. No. 4 880 567, 1989
-
A. N. Prabhu, K. W. Hang, and E. J. Conlon, "Thick Film Copper Conductor Inks," U.S. Pat. No. 4 880 567, 1989.
-
-
-
Prabhu, A.N.1
Hang, K.W.2
Conlon, E.J.3
-
15
-
-
0037549964
-
Adhesion of Copper Conductors, Part II
-
C. C. Y. Kuo, "Adhesion of Copper Conductors, Part II," Proc. Int. Microelectron. Symp., 562-68 (1987).
-
(1987)
Proc. Int. Microelectron. Symp.
, pp. 562-568
-
-
Kuo, C.C.Y.1
-
16
-
-
85033861732
-
-
"Thick Film Conductor Compositions," U.S. Pat. No. 4 540 604, 1985
-
V. P. Siuta, "Thick Film Conductor Compositions," U.S. Pat. No. 4 540 604, 1985.
-
-
-
Siuta, V.P.1
-
17
-
-
85033842855
-
-
"Metal Oxide-Coated Copper Powder," U.S. Pat. No. 4 594 181, 1986
-
V. P. Siuta, "Metal Oxide-Coated Copper Powder," U.S. Pat. No. 4 594 181, 1986.
-
-
-
Siuta, V.P.1
-
18
-
-
85033862999
-
-
"Copper Conductor Composition," U.S. Pat. No. 4 937 016, 1990
-
M. Suehiro, M. Echigo, M. Sakvhara, and N. Kawamura, "Copper Conductor Composition," U.S. Pat. No. 4 937 016, 1990.
-
-
-
Suehiro, M.1
Echigo, M.2
Sakvhara, M.3
Kawamura, N.4
|