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Volumn 79, Issue 5, 1996, Pages 1303-1306

Microstructural evolution of copper thick films observed by environmental scanning electron microscopy

Author keywords

[No Author keywords available]

Indexed keywords

BINDERS; GLASS; INK; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; THICK FILMS;

EID: 0030146704     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1996.tb08588.x     Document Type: Article
Times cited : (11)

References (18)
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    • 0022565049 scopus 로고
    • Firing Process-Related Failure in Thick-Film Copper Multilayers
    • R. J. Bacher and V. P. Siuta, "Firing Process-Related Failure in Thick-Film Copper Multilayers," Proc.-Electron. Compon. Conf., 471-80 (1986).
    • (1986) Proc.-Electron. Compon. Conf. , pp. 471-480
    • Bacher, R.J.1    Siuta, V.P.2
  • 3
    • 0022216492 scopus 로고
    • Copper Thick Film Nitrogen Atmosphere Furnace Design and Firing Process Considerations
    • J. B. Bradley, "Copper Thick Film Nitrogen Atmosphere Furnace Design and Firing Process Considerations," Proc. Int. Microelectron. Symp., 435-40 (1985).
    • (1985) Proc. Int. Microelectron. Symp. , pp. 435-440
    • Bradley, J.B.1
  • 6
    • 0023672803 scopus 로고
    • The Thermal-Cycled Adhesion of Thick-Film Copper Conductors
    • C. R. S. Needes and J. F. Knaak, "The Thermal-Cycled Adhesion of Thick-Film Copper Conductors," Proc. - Electron. Compon. Conf., 618-28 (1988).
    • (1988) Proc. - Electron. Compon. Conf. , pp. 618-628
    • Needes, C.R.S.1    Knaak, J.F.2
  • 7
    • 85033843224 scopus 로고    scopus 로고
    • "Metal Oxide-Coated Copper Powder," U.S. Pat. No. 4594 181, 1986
    • V. P. Siuta, "Metal Oxide-Coated Copper Powder," U.S. Pat. No. 4594 181, 1986.
    • Siuta, V.P.1
  • 8
    • 0022185642 scopus 로고
    • A New Air-firable Thick Film Copper Conductor
    • C. C. Y. Kuo, "A New Air-firable Thick Film Copper Conductor," Proc. Int. Microelectron. Symp., 472-77 (1985).
    • (1985) Proc. Int. Microelectron. Symp. , pp. 472-477
    • Kuo, C.C.Y.1
  • 9
    • 4243181306 scopus 로고
    • Adhesion of Thick Film Copper Conductors
    • C. C. Y. Kuo, "Adhesion of Thick Film Copper Conductors," Int. J. Hybrid Microelectron., 4 [2] 70-78 (1981).
    • (1981) Int. J. Hybrid Microelectron. , vol.4 , Issue.2 , pp. 70-78
    • Kuo, C.C.Y.1
  • 11
    • 4243194624 scopus 로고
    • Alumina Substrate and Glass Interfacial Interactions
    • Y. Nakamura, "Alumina Substrate and Glass Interfacial Interactions," Int. J. Hybrid Microelectron., 4 [2] 168-71 (1981).
    • (1981) Int. J. Hybrid Microelectron. , vol.4 , Issue.2 , pp. 168-171
    • Nakamura, Y.1
  • 12
    • 0022565049 scopus 로고
    • Firing Process-Related Failure in Thick-Film Copper Multilayers
    • R. J. Bacher and V. P. Siuta, "Firing Process-Related Failure in Thick-Film Copper Multilayers," Proc. ECC, 9, 471-80 (1986).
    • (1986) Proc. ECC , vol.9 , pp. 471-480
    • Bacher, R.J.1    Siuta, V.P.2
  • 13
    • 84986350141 scopus 로고
    • Mechanisms for Char Formation in Nitrogen Fired Thick Film Materials
    • D. Whitman, "Mechanisms for Char Formation in Nitrogen Fired Thick Film Materials," Proc. Int. Microelectron. Symp., 421-25 (1988).
    • (1988) Proc. Int. Microelectron. Symp. , pp. 421-425
    • Whitman, D.1
  • 14
    • 85033868777 scopus 로고    scopus 로고
    • "Thick Film Copper Conductor Inks," U.S. Pat. No. 4 880 567, 1989
    • A. N. Prabhu, K. W. Hang, and E. J. Conlon, "Thick Film Copper Conductor Inks," U.S. Pat. No. 4 880 567, 1989.
    • Prabhu, A.N.1    Hang, K.W.2    Conlon, E.J.3
  • 15
    • 0037549964 scopus 로고
    • Adhesion of Copper Conductors, Part II
    • C. C. Y. Kuo, "Adhesion of Copper Conductors, Part II," Proc. Int. Microelectron. Symp., 562-68 (1987).
    • (1987) Proc. Int. Microelectron. Symp. , pp. 562-568
    • Kuo, C.C.Y.1
  • 16
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    • "Thick Film Conductor Compositions," U.S. Pat. No. 4 540 604, 1985
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    • Siuta, V.P.1
  • 17
    • 85033842855 scopus 로고    scopus 로고
    • "Metal Oxide-Coated Copper Powder," U.S. Pat. No. 4 594 181, 1986
    • V. P. Siuta, "Metal Oxide-Coated Copper Powder," U.S. Pat. No. 4 594 181, 1986.
    • Siuta, V.P.1
  • 18
    • 85033862999 scopus 로고    scopus 로고
    • "Copper Conductor Composition," U.S. Pat. No. 4 937 016, 1990
    • M. Suehiro, M. Echigo, M. Sakvhara, and N. Kawamura, "Copper Conductor Composition," U.S. Pat. No. 4 937 016, 1990.
    • Suehiro, M.1    Echigo, M.2    Sakvhara, M.3    Kawamura, N.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.